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Resolution Enhancement Techniques in Optical Lithography (SPIE Tutorial Texts in Optical Engineering Vol. TT47)

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Resolution Enhancement Techniques in Optical Lithography (SPIE Tutorial Texts in Optical Engineering Vol. TT47)
- Used Book in Good Condition
This tutorial summarizes optical lithography enhancement research and development over the past 20 years. Discusses theoretical and practical aspects of commonly used techniques, including optical imaging and resolution, modified illumination, optical proximity correction, alternating and attenuating phase-shifting masks, selecting RETs, and second-generation RETs. Useful for students and practicing lithographers.
Contents
- Foreword
- Preface
- List of symbols
- Introduction
- Optical imaging and resolution
- Modified illumination
- Optical proximity correction
- Alternating phase-shifting mask
- Attenuated phase-shift mask
- Selecting appropriate RETs
- Second-generation RETs
- Concluding remarks
- k1 conversion charts
- Bibliography
- Index
Country USA
Brand Brand: SPIE Publications
Manufacturer SPIE Publications
Binding Paperback
EANs 9780819439956
ReleaseDate 0000-00-00

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